期刊


ISSN0946-7076
刊名Microsystem technologies
参考译名微系统技术：传感器，致动器与系统集成
收藏年代1998～2024

关联期刊参考译名收藏年代
Journal of Information Storage and Processing Systems存储与处理系统信息杂志2000～2001


全部

1998 1999 2000 2001 2002 2003
2004 2005 2006 2007 2008 2009
2010 2011 2012 2013 2014 2015
2016 2017 2018 2019 2020 2021
2022 2023 2024

1998, vol.4, no.2 1998, vol.4, no.3 1998, vol.4, no.4 1998, vol.5, no.1 1998, vol.5, no.2

题名作者出版年年卷期
A hard x-ray prototype production exposure station at NSLSE. D. Johnson; J. Ch. Milne19981998, vol.4, no.2
Characterisation of defects in very high deep-etch x-ray lithography microstructuresF. J. Pantenburg; S. Achenbach; J. Mohr19981998, vol.4, no.2
Characterization of exposure and processing of thick PMMA for deep x-ray lithography using hard x-raysF. De Carlo; D. C. Mancini; B. Lai; J. J. Song19981998, vol.4, no.2
Dosage modeling for deep x-ray lithography applicationW. -P. Shih; G. -J. Hwang; B. -Y. Shew; Y. Cheng19981998, vol.4, no.2
Enhanced adhesion of PMMA to copper with black oxide for electrodeposition of high aspect ratio nickel-iron microstructuresV. K. P. Kanigicherla; K. W. Kelly; E. Ma; W. Wang; M. C. Murphy19981998, vol.4, no.2
Fabrication of intermediate mask for deep x-ray lithographyJ. T. Sheu; M. H. Chiang; S. Su19981998, vol.4, no.2
High precision, low cost mask for deep x-ray lithographyB. -Y. Shew; Y. Cheng; W. -P. Shih; M. Lu; W. H. Lee19981998, vol.4, no.2
High speed hydraulic scanner for deep x-ray lithographyJ. C. Milne; E. D. Johnson19981998, vol.4, no.2
Modeling electrodeposition for LIGA microdevice fabricationS. K. Griffiths; R. H. Nilson; A. Ting; R. W. Bradshaw; W. D. Bonivert; J. M. Hruby19981998, vol.4, no.2
New development strategies for high aspect ratio microstructuresJ. Zanghellini; S. Achenbach; A. El-Kholi; J. Mohr; F. J. Pantenburg19981998, vol.4, no.2
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