知识中心主页
文献服务
文献资源
外文期刊
外文会议
专业机构
智能制造
高级检索
版权声明
使用帮助
期刊
ISSN
0018-9219
刊名
Proceedings of the IEEE
参考译名
电气与电子工程师学会会报
收藏年代
1998~2013
全部
1998
1999
2000
2001
2002
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2001, vol.89, no.10
2001, vol.89, no.11
2001, vol.89, no.12
2001, vol.89, no.2
2001, vol.89, no.3
2001, vol.89, no.4
2001, vol.89, no.5
2001, vol.89, no.6
2001, vol.89, no.7
2001, vol.89, no.8
2001, vol.89, no.9
题名
作者
出版年
年卷期
Fundamental limits of silicon technology
Robert W. Keyes
2001
2001, vol.89, no.3
Material and process limits in silicon VLSI technology
James D. Plummer; Peter B. Griffin
2001
2001, vol.89, no.3
Device scaling limits of Si MOSFETs and their application dependencies
David J. Frank; Robert H. Dennard; Edward Nowak; Paul M. Solomon; Yuan Taur; Hon-Sum Philip Wong
2001
2001, vol.89, no.3
Analog at milepost 2000: a personal perspective
Barrie Gilbert
2001
2001, vol.89, no.3
Interconnect limits on gigascale integration (GSI) in the 21st century
Jeffrey A. Davis; Raguraman Venkatesan; Alain Kaloyeros; Michael Beylansky; Shukri J. Souri; Kaustav Banerjee; Krishna C. Saraswat; Arifur Rahman; Rafael Reif; James D. Meindl
2001
2001, vol.89, no.3
Coming challenges in microarchitecture and architecture
Ronny Ronen; Avi Mendelson; Konrad Lai; Shih-Lien Lu; Fred Pollack; John P. Shen
2001
2001, vol.89, no.3
Limitations and challenges of computer-aided design technology for CMOS VLSI
Randal E. Bryant; Kwang-Ting Cheng; Andrew B. Kahng; Kurt Keutzer; Wojciech Maly; Richard Newton; Lawrence Pileggi; Jan M. Rabaey; Alberto Sangiovanni-Vincentelli
2001
2001, vol.89, no.3
Limits of lithography
Lloyd R. Harriott
2001
2001, vol.89, no.3
Limits of integrated-circuit manufacturing
Robert Doering; Yoshio Nishi
2001
2001, vol.89, no.3
New paradigm of silicon technology
Tadahiro Ohmi; Shigetoshi Sugawa; Koji Kotani; Masaki Hirayama; Akihiro Morimoto
2001
2001, vol.89, no.3
制造业外文文献服务平台