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2002, vol.14, no.7	2002, vol.14, no.8

题名	作者	出版年	年卷期
Characteristics of plasmaless dry etching of silicon-related materials using chlorine trifluoride gas	Yoji Saito	2002	2002, vol.14, no.5
Silicon dioxide micropillars for sieving fabricated by macroporous silicon-based micromachining	Shinichi Izuo; Hiroshi Ohji; Patrick J. French; Kazuhiko Tsutsumi; Masafumi Kimata	2002	2002, vol.14, no.5
High-sensitivity hybrid hall effect ICs with thin film hall elements	Kazutoshi Ishibashi; Ichiro Okada; Ichiro Shibasaki	2002	2002, vol.14, no.5
Heteroepitaxial growth of GaN on γ-Al{sub}2O{sub}3/Si substrate by organometallic vapor phase epitaxy	Akihiro Wakahara; Nobuharu Kawamura; Hiroshi Oishi; Hiroshi Okada; Akira Yoshida; Makoto Ishida	2002	2002, vol.14, no.5
Growth-mode control in sublimation epitaxy of AlN	Tomoaki Furusho; Shigehiro Nishino	2002	2002, vol.14, no.5
Influence of initial layers on crystallinity of NiO(111) epitaxial film grown at room temperature by pulsed laser deposition	Yoshiharu Kakehi; Satoru Nakao; Kazuo Satoh; Tadaoki Kusaka	2002	2002, vol.14, no.5