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期刊
ISSN
0013-4686
刊名
Electrochimica Acta
参考译名
国际电化学杂志:电化学学报
收藏年代
1998~2024
全部
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2005
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2005, vol.50, no.10
2005, vol.50, no.11
2005, vol.50, no.12
2005, vol.50, no.13
2005, vol.50, no.14
2005, vol.50, no.15
2005, vol.50, no.16-17
2005, vol.50, no.18
2005, vol.50, no.19
2005, vol.50, no.20
2005, vol.50, no.21
2005, vol.50, no.22
2005, vol.50, no.23
2005, vol.50, no.24
2005, vol.50, no.25-26
2005, vol.50, no.27
2005, vol.50, no.28
2005, vol.50, no.5
2005, vol.50, no.6
2005, vol.50, no.7-8
2005, vol.50, no.9
2005, vol.51, no.1
2005, vol.51, no.2
2005, vol.51, no.3
2005, vol.51, no.4
2005, vol.51, no.5
2005, vol.51, no.6
题名
作者
出版年
年卷期
MOCVD of hard metallurgical coatings: Examples in the Cr-C-N system
F. Maury
2005
2005, vol.50, no.23
Characterization of composite titanium nitride coatings prepared by reactive plasma spraying
G. M. Ingo; S. Kaciulis; A. Mezzi; T. Valente; F. Casadei; G. Gusmano
2005
2005, vol.50, no.23
Properties of electrodeposited nanocrystalline Ni-B alloy films
K. H. Lee; D. Chang; S. C. Kwon
2005
2005, vol.50, no.23
Tribological study of Ni matrix composite coatings containing nano and micro SiC particles
P. Gyftou; M. Stroumbouli; E. A. Pavlatou; P. Asimidis; N. Spyrellis
2005
2005, vol.50, no.23
Corrosion and wear resistant electrodeposited composite coatings
Maria Lekka; Niki Kouloumbi; Mauro Gajo; Pier Luigi Bonora
2005
2005, vol.50, no.23
Phase structure of electrodeposited alloys
P. L. Cavallotti; L. Nobili; A. Vicenzo
2005
2005, vol.50, no.23
Materials computation towards technological impact: The multiscale approach to thin films deposition
Carlo Cavallotti; Marco Di Stanislao; Davide Moscatelli; Alessandro Veneroni
2005
2005, vol.50, no.23
Development of high-performance magnetic thin film for high-density magnetic recording
Tetsuya Osaka; Toru Asahi; Jun Kawaji; Tokihiko Yokoshima
2005
2005, vol.50, no.23
Silver nanostructured catalyst for modification of dielectrics surface
Algirdas Vaskelis; Aldona Jagminiene; Loreta Tamasauskaite-Tamasiunaite; Remigijus Juskenas
2005
2005, vol.50, no.23
MOCVD deposition of CoAl{sub}2O{sub}4 films
G. Carta; M. Casarin; N. El Habra; M. Natali; G. Rossetto; C. Sada; E. Tondello; P. Zanella
2005
2005, vol.50, no.23
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