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期刊
ISSN
0913-5685
刊名
電子情報通信学会技術研究報告
参考译名
电子信息通信学会技术研究报告:可靠性
收藏年代
2000~2024
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2015, vol.115, no.100
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题名
作者
出版年
年卷期
レーザーアブレーション法によるAlN/Si(110)基板上へのSiC成長
成田舜基; 目黒一煕; 中澤日出樹
2015
2015, vol.115, no.179
レーザーアブレーション法によるAlN/Si(110)基板上SiC薄膜の作製と評価
目黒一煕; 成田舜基; 中澤日出樹
2015
2015, vol.115, no.179
絶縁バリアとしてのSiN_x膜の低温作製
武山真弓; 佐藤勝; 小林靖志; 中田義弘; 中村友二; 野矢厚
2015
2015, vol.115, no.179
フローセルを用いた溶液成長法によるSnS薄膜の作製
早川諒; 高野泰; 石田明広
2015
2015, vol.115, no.179
エアロゾルデポジション法を用いた酸化物厚膜熱電素子の作製と評価
白井克典; 白井小雪; 中村雄一; 井上光輝
2015
2015, vol.115, no.179
[CaFeO_x/LaFeO_3]人工超格子の電気的磁気的特性
大橋祥平; 大島佳祐; 渡部雄太; 稲葉隆哲; 王春; 張埼; 松山裕貴; 高瀬浩一; 橋本拓也; 永田知子; 宋華平; 山本寛; 岩田展幸
2015
2015, vol.115, no.179
BiFe_(1-x)Mn_xO_3薄膜及び[CaFeO_x/BiFe_(1-x)Mn_xO_3]人工超格子の電気的特性
稲葉隆哲; 渡部雄太; 大島佳祐; 王春; 宋華平; 大橋祥平; 張琦; 高瀬浩一; 橋本拓也; 永田知子; 山本寛; 岩田展幸
2015
2015, vol.115, no.179
単層カーボンナノチューブのカイラリティ制御における自由電子レーザー照射
吉田圭佑; 川口大貴; 小林弥生; 春宮清之介; 永田知子; 山本寛; 岩田展幸
2015
2015, vol.115, no.179
ラジカル反応を用いたHfN_x膜の低温作製
佐藤勝; 武山真弓; 野矢厚
2015
2015, vol.115, no.179
SOI基板上への高密度Geナノドットの形成-フォトニック結晶による発光効率改善を目指して
森岡真; 渡邊航大; 冨田政隆; 豊田英之; 加藤有行; 玉山泰宏; 上林利生; 安井寛治
2015
2015, vol.115, no.179
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