期刊


ISSN0913-5685
刊名電子情報通信学会技術研究報告
参考译名电子信息通信学会技术研究报告:可靠性
收藏年代2000~2024



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013 2014 2015 2016 2017
2018 2019 2020 2021 2022 2023
2024

2016, vol.116, no.1 2016, vol.116, no.100 2016, vol.116, no.102 2016, vol.116, no.103 2016, vol.116, no.114 2016, vol.116, no.118
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题名作者出版年年卷期
触媒反応生成高エネルギーH_2Oビームのエネルギー状態小野翔太郎; 田島諒一; 寺口祐介; 高橋一匡; 玉山泰宏; 安井寛治20162016, vol.116, no.99
ラミネーションコンタクト電極を用いた有機単結晶の電気測定酒井正俊; 多田裕作; 後藤大河; 岡田悠悟; 山内博; 工藤一浩20162016, vol.116, no.99
リジッド及びフレキシブルプリント配線板銅箔の電磁圧接(第2報)相沢友勝; 杉山善崇20162016, vol.116, no.99
溶液成長法を用いた硫化スズ(SnS)形成技術の探索野毛悟20162016, vol.116, no.99
SrTiO_3(110)上に成膜したBiFeO_3薄膜および人工超格子の結晶構造解析及び磁気的特性松山裕貴; 王春; 大橋祥平; 張琦; 宋華平; 渡部雄太; 永田知子; 橋本拓也; 山本寛; 岩田展幸20162016, vol.116, no.99
2層グラフェン層間化合物の電気特性のFeインターカレート濃度依存性星野崚; 倉金夏己; 櫻井亮太; 山岸多門; 永田知子; 岩田展幸; 山本寛20162016, vol.116, no.99
YAlO_3(001)基板上でのCr_2O_3薄膜の成膜条件の最適化および結晶構造解析橋本浩佑; 隅田貴士; 福井慎二郎; 平戸剛志; 柳原康宏; 永田知子; 山本寛; 岩田展幸20162016, vol.116, no.99
溶液成長法によるCuO及びCu_2O薄膜の成長と表面モフォロジー寺迫智昭; 門田直己; 大森裕也; 佐伯拓哉20162016, vol.116, no.99
触媒反応支援CVD法による非極性ZnO結晶膜の成長田島諒一; 池田宗謙; 叶内慎吾; 大石耕一郎; 片桐裕則; 玉山泰宏; 安井寛治20162016, vol.116, no.99
無電解ニッケルめっきの製造条件による皮膜形態とその硬化挙動水内理映子; 久里裕二; 小谷和也20162016, vol.116, no.98
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