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期刊
ISSN
0913-5685
刊名
電子情報通信学会技術研究報告
参考译名
电子信息通信学会技术研究报告:可靠性
收藏年代
2000~2024
全部
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2019, vol.119, no.10
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题名
作者
出版年
年卷期
SiO_2/GaN MOS構造における電極形成後アニール前後の界面及び膜中電荷の評価
古川暢昭; 上沼睦典; 石河泰明; 浦岡行治
2019
2019, vol.119, no.356
ミストCVD法によるGa-Sn-O薄膜を用いたメモリスタ開発
小林雅樹; 杉崎澄生; 木村睦
2019
2019, vol.119, no.356
Al_2O_3絶縁膜上に作製したGa-Sn-0 TFT
服部一輝; 谷野健太; 松田時宜; 川原村敏幸; 劉麗; 木村睦
2019
2019, vol.119, no.356
量子デバイスに向けた球殼状タンパク質をテンプレートとしたCuInS_2ナノ粒子作製
唐木裕馬; 宮永良子; 岡本尚文; 石河泰明; 山下一郎; 浦岡行治
2019
2019, vol.119, no.356
薄膜デバイスを用いた人工網膜の生体外実験
豊田航平; 冨岡圭佑; 三澤慶悟; 内藤直矢; 木村睦
2019
2019, vol.119, no.356
ニューラルネットワークのための多層クロスポイント型シナプス素子
津野拓海; 近藤厚志; 新村純平; 田中遼; 山川大樹; 柴山友輝; 岩城江津子; 木村睦
2019
2019, vol.119, no.356
2段階堆積プロセスを用いた(Bi, La)_4Ti_3O_(12)薄膜の結晶成長
吉田誉; 石崎勇真; 宮部雄太; 木村睦
2019
2019, vol.119, no.356
Ga-Sn-O薄膜を用いた抵抗変化型メモリのメモリスタ特性の電極依存性
橋本快人; 倉崎彩太; 田中遼; 杉崎澄生; 角田涼; 木村睦
2019
2019, vol.119, no.356
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