会议文集


文集名Precision Engineering and Mechatronics Supporting the Semiconductor Industry
会议名ASPE 2012 Summer Topical Meeting
中译名《2012年美国精密工程学会夏季主题会议：半导体行业的精密机械和机电一体化》
机构American Society for Precision Engineering (ASPE)
会议日期June 24-27, 2012
会议地点Berkeley, California,USA
出版年2012
馆藏号305387


题名作者出版年
DESIGN AND VERIFICATION OF A COARSE STAGE OF PLANAR MOTOR LEVITAING BY AIR BEARINGZhigang Zhang; Liwei Wu; Xiaowen Zhang; Feng Chi; Jianrui Cheng2012
FLEXURE-BASED MICROSCOPE OBJECTIVEChristopher R. Stockbridge; Fatih H. Koklu; Euan Ramsay; Yang Lu; M. Selim Unlu; Bennett B. Goldberg; Thomas G. Bifano2012
EXTENDING ALL-OPTICAL PROCESSES TO THE 11NM (20NM HALF-PITCH) TECHNOLOGY NODERudi H. Hendel; John S. Petersen; David A. Markle; Alexander K. Raub; Robert T. Greenway; Michael C. Smayling2012
PLASMONIC IMAGING LITHOGRAPHY MACHINE (PILM)Mohamed E. Saad; Robert J. Hocken2012
Status of Jet and Flash Imprint Lithography Steppers for Sub-25nm Semiconductor Memory ManufacturingBabak Mokaberi; Pawan Nimmakayala; Zhengmao Ye; Philip Schumaker; Jin Choi; Dwayne LaBrake; S. V. Sreenivasan2012
Recent Advancements in Long-Travel, Nanoscale Optic/Substrate Positioning with Quantitative Measurement of Long-Term StabilityScott C. Jordan2012
CONCEPTUAL DESIGN OF MECHATRONIC MACHINE COMPONENTS USING TOPOLOGY OPTIMIZATIONKostiantyn Vandyshev; Matthijs Langelaar; Fred van Keulen; Jan van Eijk2012
FIBER-COUPLED 3-DOF INTERFEROMETER FOR EUV LITHOGRAPHY STAGE METROLOGYJonathan D. Ellis; Steven Gillmer; Chen Wang; Richard Smith; Shane C. Woody; Joshua Tarbutton2012
DIMENSIONAL METROLOGY OF PLASMONIC NANOLITHOGRAPHY MACHINEKang Ni; Robert J. Hocken2012
VIBRATION SPECTRA AND ASYNCHRONOUS ERROR MOTION OF ULTRA-PRECISION AIR BEARING SPINDLESByron Knapp; Dan Oss; Dave Arneson; Mel Liebers; Eric Marsh2012
CREATING AN EUV MASK MICROSCOPE FOR LITHOGRAPHY GENERATIONS REACHING 8 NMKenneth A. Goldberg; Iacopo Mochi; Markus P. Benk; Arnaud P. Allezy; Nathan S. Smith; Carl W. Cork; William Cork; James Macdougall; Weilun L. Chao; Erik H. Anderson; Patrick P. Naulleau; Eric Acome; Eric Van Every; Veljko Milanovic; Senajith B. Rekawa2012
Moving-Magnet Planar Motors for Next-Generation LithographyXiaodong Lu; Irfan-ur-rab Usman2012
RECENT DEVELOPMENTS AND COMPARATIVE EVALUATION OF LORENTZ AND RELUCTANCE ACTUATORS FOR HIGH PRECISION SEMICONDUCTOR EQUIPMENT STAGESAdrian Toma; Funda Sahin; Marcel Renkens2012
AN ALTERNATIVE PERMANENT MAGNET BRUSHLESS MOTOR ARCHITECTURETy Safreno; Troy Kelley; Richard Goldsmith2012
High-Speed Creation of Nanometer-Scale Features - NanocoiningThomas A. Dow; Erik M. Zdanowicz; W. John Nowak2012
MECHANICAL PATTERNING OF OPTICAL MICROSTRUCTURESEkkard Brinksmeier; Ralf Glabe; Lars Schonemann; Axel Meier2012
COORDINATING DIGITAL I/O WITH PRECISION MOTIONCurtis S. Wilson2012
ENGINEERING INTERPRETATION OF EIGENVECTOR SENSITIVITIES USING NORMALIZATIONE. C. Hooijkamp; H. J. Peters; F. van Keulen; J. van Eijk2012
Semiconductor Lithography: Enabling Production Beyond 22 nmMike Binnard; Yuichi Shibazaki; Masato Hamatani; Shinji Wakamoto; Yuji Shiba; Yusaku Uehara; Tomoharu Fujiwara2012
ROBUSTNESS ANALYSIS OF DYNAMICS AND CONTROL A NEW METHOD TO SUPPORT HIGH PERFORMANCE OPTICAL MANIPULATOR DESIGNUlrich Schonhoff2012
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