期刊


ISSN1063-7397
刊名Russian Microelectronics
参考译名俄罗斯微电子学
收藏年代2002~2023



全部

2002 2003 2004 2005 2006 2007
2008 2009 2010 2011 2012 2013
2014 2015 2016 2017 2018 2019
2020 2021 2022 2023

2008, vol.37, no.1 2008, vol.37, no.2 2008, vol.37, no.3 2008, vol.37, no.4 2008, vol.37, no.5 2008, vol.37, no.6

题名作者出版年年卷期
IC Performance Degradation: Simulation and ForecastingA. V. Strogonov20082008, vol.37, no.3
New Experiments on Iterative Synthesis of Combinational CircuitsP. N. Bibilo; V. I. Romanov20082008, vol.37, no.3
Improved Multistep Method of Ion Implantation into Silicon for IC ManufactureV. I. Plebanovich; A. R. Chelyadinskii; Yu. B. Vasil'ev; A. I. Gladchuk; V. E. Osipov20082008, vol.37, no.3
Depth Profiles of Refractive Index in Thermally Grown and LPCVD Oxide Films on SiliconB. M. Ayupov; S. F. Devyatova; V. G. Erkov; L. A. Semenova20082008, vol.37, no.3
Submicrometer- and Nanometer-Structure Formation on the Surface of Epitaxial IV-VI Semiconductor Films by Ar-Plasma TreatmentS. P. Zimin; E. S. Gorlachev; I. I. Amirov; M. N. Gerke20082008, vol.37, no.3
New CMOS Process Using a Thermal-Oxide Mask for Making n{sup}-- and p{sup}--WellsYu. P. Snitovsky; M. G. Krasikov20082008, vol.37, no.3
Electron-Beam-Induced Modification of PbSnTe Surface Morphology under HEED Monitoring of MBE GrowthL. A. Borynyak; A. A. Velichko; V. A. Ilyushin; D. I. Ostertak; Yu. G. Peisakhovich; N. I. Filimonova20082008, vol.37, no.3
Response of the Electron Plasma in a Thin Metal Slab to a Low-Frequency External Electric FieldA. V. Latyshev; A. A. Yushkanov20082008, vol.37, no.3