知识中心主页
文献服务
文献资源
外文期刊
外文会议
专业机构
智能制造
高级检索
版权声明
使用帮助
期刊
ISSN
0914-4935
刊名
Sensors and materials
参考译名
传感器与材料
收藏年代
1998~2023
全部
1998
1999
2000
2001
2002
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2014
2015
2016
2017
2018
2019
2020
2021
2022
2023
2003, vol.15, no.1
2003, vol.15, no.2
2003, vol.15, no.3
2003, vol.15, no.4
2003, vol.15, no.5
2003, vol.15, no.6
2003, vol.15, no.7
2003, vol.15, no.8
题名
作者
出版年
年卷期
Dependence of the anisotropy of wet chemical etching of silicon on the amount of surface coverage by OH radicals
Miguel A. Gosalvez; Adam S. Foster; Risto M. Nieminen
2003
2003, vol.15, no.2
Modelling of anisotropic etching of silicon: anomalies due to facet boundary effects
Ziyad Elalamy; Leslie M. Landsberger; Mojtaba Kahrizi; Anand Pandy; Irina Stateikina; Sebastien Michel
2003
2003, vol.15, no.2
Anisotropic Si etching condition for preparing optically smooth surfaces
Minoru Sasaki; Takehiro Fujii; Kazuhiro Hane
2003
2003, vol.15, no.2
Difference in activated atomic steps on (111) silicon surface during KOH and TMAH etching
Kazuo Sato; Takehiro Masuda; Mitsuhiro Shikida
2003
2003, vol.15, no.2
Effects of mask misalignment and wafer misorientation on silicon V-groove etching
Songsheng Tan; Robert Boudreau; Michael L. Reed
2003
2003, vol.15, no.2
制造业外文文献服务平台