期刊


ISSN0957-4522
刊名Journal of Materials Science
参考译名材料科学杂志：电子材料
收藏年代1999～2013



全部

1999 2000 2001 2002 2003 2004
2005 2006 2007 2008 2009 2010
2011 2012 2013

2010, vol.21, no.1 2010, vol.21, no.10 2010, vol.21, no.11 2010, vol.21, no.12 2010, vol.21, no.2 2010, vol.21, no.3
2010, vol.21, no.4 2010, vol.21, no.5 2010, vol.21, no.6 2010, vol.21, no.7 2010, vol.21, no.8 2010, vol.21, no.9

题名作者出版年年卷期
Low temperature sintering of Li_(1.1)Nb_(0.58)Ti_(0.5)O_3-xBi_2O_3 dielectric with adjustable temperature coefficientPing Zhang; Lingxia Li; Guochao Li; Wei Zhang20102010, vol.21, no.3
The sensitivity of the electron transport within bulk wurtzite indium nitride to variations in the crystal temperature, the doping concentration, and the non-parabolicity coefficient: an updated Monte Carlo analysisStephen K. O'Leary; Brian E. Foutz; Michael S. Shur; Lester F. Eastman20102010, vol.21, no.3
Study on properties of forsterite/cordierite ceramic compositesHaikui Zhu; Hongqing Zhou; Ying Xie; Min Liu20102010, vol.21, no.3
Two critical grain sizes of Ba_(0.6)Sr_(0.4)TiO_3 thin filmsHongwei Chen; Chuanren Yang; Jihua Zhang; Wenjian Leng; Hong Ji; Zhihong Wang; Jiaxuan Liao; Li Zhao20102010, vol.21, no.3
Structure and piezoelectric properties of lead-free (Na_(0.52)K_(0.44-x))(Nb_(0.95-x)Sb_(0.05))O_3-xLiTaO_3 ceramicsJian Fu; Ruzhong Zuo; Danya Lv; Yi Liu; Yang Wu20102010, vol.21, no.3
Microstructure and electrical properties of (Ta, Co, Pr) doped TiO_2 based electroceramicsV. C. Sousa; M. M. Oliveira; M. O. Orlandi; E. Longo20102010, vol.21, no.3
Microwave dielectric properties of low temperature firing (Li_(1/2)Nd_(1/2))WO_4 ceramicHuanfu Zhou; Hong Wang; Kecheng Li; Minghui Zhang; Haibo Yang20102010, vol.21, no.3
Study on creep characterization of nano-sized Ag particle-reinforced Sn-Pb composte solder jointsYaowu Shi; Jianping Liu; Zhidong Xia; Yongping Lei; Fu Guo; Xiaoyan Li20102010, vol.21, no.3
Impression creep of the rare-earth doped Sn-2% Bi lead-free solder alloyR. Mahmudi; A. R. Geranmayeh; M. Salehi; H. Pirayesh20102010, vol.21, no.3
Crystallization of silicon films by new metal mediated mechanismChiung Wei Lin; Seng Chi Lee; Yeong Shyang Lee20102010, vol.21, no.3
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