知识中心主页
文献服务
文献资源
外文期刊
外文会议
专业机构
智能制造
高级检索
版权声明
使用帮助
期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
2001
2002
2003
2004
2005
2006
2007
2008
2009
2010
2011
2012
2013
2008, vol.26, no.1
2008, vol.26, no.2
2008, vol.26, no.3
2008, vol.26, no.4
2008, vol.26, no.5
2008, vol.26, no.6
题名
作者
出版年
年卷期
Plasma-assisted atomic layer deposition of Ta{sub}2O{sub}5 from alkylamide precursor and remote O{sub}2 plasma
S. B. S. Heil; F. Roozeboom; M. C. M. van de Sanden; W. M. M. Kessels
2008
2008, vol.26, no.3
Dielectric properties of high-density-plasma fluorinated-silicate glass by doping nitrogen
B. J. Wei; Y. L. Cheng; Y. L. Wang; F. H. Lu; H. C. Shin
2008
2008, vol.26, no.3
Operational regimes of the saddle field plasma enhanced chemical vapor deposition system
Erik V. Johnson; Stefan Zukotynski; Nazir P. Kherani
2008
2008, vol.26, no.3
Multilayer transparent electrode consisting of silver alloy layer and metal oxide layers for organic luminescent electronic display device
Katsuhiko Koike; Shin Fukuda
2008
2008, vol.26, no.3
Mechanical properties of amorphous hydrogenated carbon films fabricated on polyethylene terephthalate foils by plasma immersion ion implantation and deposition
Jing Li; Xiubo Tian; Shiqin Yang; Paul K. Chu; Ricky K. Y. Fu
2008
2008, vol.26, no.3
Surface phase diagram and alloy formation for antimony on Au(110)
S. S. Parihar; P. F. Lyman
2008
2008, vol.26, no.3
Recombination probability of oxygen atoms on dynamic stainless steel surfaces in inductively coupled O{sub}2 plasmas
Luc Stafford; Joydeep Guha; Vincent M. Donnelly
2008
2008, vol.26, no.3
Role of chamber dimension in fluorocarbon based deposition and etching of SiO{sub}2 and its effects on gas and surface-phase chemistry
E. A. Joseph; B.-S. Zhou; S. P. Sant; L. J. Overzet; M. J. Goeckner
2008
2008, vol.26, no.3
Evolution of epitaxial Ta{sub}2O{sub}5 and Ta{sub}2O films during thermal oxidation of epitaxial tantalum films on sapphire substrates
S. Gnanarajan; S. K. H. Lam
2008
2008, vol.26, no.3
Tungsten atomic layer deposition on cobalt nanoparticles
C. A. Wilson; D. N. Goldstein; J. A. McCormick; A. W. Weimer; S. M. George
2008
2008, vol.26, no.3
1
2
3
4
制造业外文文献服务平台