期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2005, vol.23, no.1 2005, vol.23, no.2 2005, vol.23, no.3 2005, vol.23, no.4 2005, vol.23, no.5 2005, vol.23, no.6

题名作者出版年年卷期
Simple method for estimating and comparing X-ray damage ratesD. R. Baer; M. H. Engelhard; A. S. Lea; L. V. Saraf20052005, vol.23, no.6
Use of glovebags for less hazardous working conditions during the maintenance operations on molecular-beam epitaxy systemsMichael M. Oye; J. Ahn; C. Cao; H. Chen; W. Fordyce; D. Gazula; S. Govindaraju; J. B. Hurst; S. Lipson; D. Lu; J. M. Reifsnider; O. Shchekin; R. Sidhu; X. Sun; D. G. Deppe; A. L. Holmes, Jr.; Terry J. Mattord20052005, vol.23, no.6
Tailored synthesis of TiC/a-C nanocomposite tribological coatingsD. Martinez-Martinez; C. Lopez-Cartes; A. Justo; A. Fernandez; J. C. Sanchez-Lopez; A. Garcia-Luis; M. Brizuela; J. I. Onate20052005, vol.23, no.6
Technique for the production, preservation, and transportation of H atoms in metal chambers for processingsS. G. Ansari; Hironobu Umemoto; Takashi Morimoto; Koji Yoneyama; Atsushi Masuda; Hideki Matsumura; Manabu Ikemoto; Keiji Ishibashi20052005, vol.23, no.6
Application of a Matsumoto-Ohtsuka-type vacuum flange to beam ducts for future acceleratorsY. Suetsugu; M. Shirai; M. Ohtsuka20052005, vol.23, no.6
Quantitative analysis of sputter processes in a small magnetron systemIvo Knittel; Marc Gothe; Uwe Hartmann20052005, vol.23, no.6
Optical band gaps and composition dependence of hafnium-aluminate films grown by atomic layer chemical vapor depositionN. V. Nguyen; S. Sayan; I. Levin; J. R. Ehrstein; I. J. R. Baumvol; C. Driemeier; C. Krug; L. Wielunski; P. Y. Hung; Alain Diebold20052005, vol.23, no.6
In situ photovoltage measurements using femtosecond pump-probe photoelectron spectroscopy and its application to metal-HfO{sub}2-Si structuresDaeyoung Lim; Richard Haight20052005, vol.23, no.6
Etching characteristics of high-k dielectric HfO{sub}2 thin films in inductively fluorocarbon plasmasKazuo Takahashi; Kouichi Ono; Yuichi Setsuhara20052005, vol.23, no.6
Direct imprinting using soft mold and gas pressure for large area and curved surfacesJer-Haur Chang; Fang-Sung Cheng; Chi-Chung Chao; Yung-Chun Weng; Sen-Yeu Yang; Lon A. Wang20052005, vol.23, no.6
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