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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2001
2002
2003
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2013
2002, vol.20, no.1
2002, vol.20, no.2
2002, vol.20, no.3
2002, vol.20, no.4
2002, vol.20, no.5
2002, vol.20, no.6
题名
作者
出版年
年卷期
Refractive index control of silicon nitride films prepared by radio-frequency reactive sputtering
P. S. Nayar
2002
2002, vol.20, no.6
Low temperature deposition of α-Al{sub}2O{sub}3 thin films by sputtering using a Cr{sub}2O{sub}3 template
P. Jin; G. Xu; M. Tazawa; K. Yoshimura; D. Music; J. Alami; U. Helmersson
2002
2002, vol.20, no.6
High-sensitivity X-ray photoelectron spectroscopy characterization of a quantum device structure
M. Wintrebert-Fouquet; K. S. A. Butcher
2002
2002, vol.20, no.6
Effect of surface polymerization on plasma and process stability in polycrystalline-silicon etching
Songlin Xu; Thorsten Lill; Shashank Deshmukh; Olivier Joubert
2002
2002, vol.20, no.6
Conductance calculation of a long tube with equilateral triangle cross section
Ping Fan; Ji-Guo Chu; Jian-Da Shao
2002
2002, vol.20, no.6
Dramatic change of electrical properties in La-Ba-Mn-O thin films prepared using bias sputtering
Jong Cheol Lee; Sang Yu Ie; Seung Iel Park; Yeongjin Yi; Gyu In Jang; Ho Shik Song; Dong Gyun You; Kwangho Jeong
2002
2002, vol.20, no.6
Plasma-surface kinetics and simulation of feature profile evolution in Cl{sub}2+HBr etching of polysilicon
Weidong Jin; Steven A. Vitale; Herbert H. Sawin
2002
2002, vol.20, no.6
Photoelastic modulation-reflection absorption infrared spectroscopy of CO on Pd(111)
D. Stacchiola; A. W. Thompson; M. Kaltchev; W. T. Tysoe
2002
2002, vol.20, no.6
Atomic layer deposition of zirconium silicate films using zirconium tetrachloride and tetra-n-butyl orthosilicate
Won-Kyu Kim; Sang-Woo Kang; Shi-Woo Rhee; Nae-In Lee; Jong-Ho Lee; Ho-Kyu Kang
2002
2002, vol.20, no.6
Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films
O. Kappertz; R. Drese; M. Wuttig
2002
2002, vol.20, no.6
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