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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2013
2010, vol.28, no.1
2010, vol.28, no.2
2010, vol.28, no.3
2010, vol.28, no.4
2010, vol.28, no.5
2010, vol.28, no.6
题名
作者
出版年
年卷期
X-ray photoelectron spectroscopy study of polyimide thin films with Ar cluster ion depth profiling
T. Miyayama; N. Sanada; M. Suzuki; J. S. Hammond; S.-Q. D. Si; A. Takahara
2010
2010, vol.28, no.2
Modifying the composition of hydrogen-terminated silicon nanoparticles synthesized in a nonthermal rf plasma
Jason Holm; Jeffrey T. Roberts
2010
2010, vol.28, no.2
Photoconduction in silicon rich oxide films obtained by low pressure chemical vapor deposition
J. A. Luna-Lopez; M. Aceves-Mijares; J. Carrillo-Lopez; A. Morales-Sanchez
2010
2010, vol.28, no.2
Coexistence of epitaxial Ta(111) and Ta(110) oriented magnetron sputtered thin film on c-cut sapphire
S. Gnanarajan; S. K. H. Lam; A. Bendavid
2010
2010, vol.28, no.2
Comparison of compressive and tensile relaxed composition-graded GaAsP and (Al)InGaP substrates
M. J. Mori; S. T. Boles; E. A. Fitzgerald
2010
2010, vol.28, no.2
Fast and smooth etching of indium tin oxides in BCl_3/Cl_2 inductively coupled plasmas
H. B. Andagana; X. A. Cao
2010
2010, vol.28, no.2
Influence of the magnetron on the growth of aluminum nitride thin films deposited by reactive sputtering
G. F. Iriarte
2010
2010, vol.28, no.2
In situ observation of change in surface atomic arrangement of Sc-O/W(100) system during phase transition at high temperature
T. Nagatomi; Y. Nakanishi; Y. Takai
2010
2010, vol.28, no.2
Oxygen plasma damage to blanket and patterned ultralow-k surfaces
J. Bao; H. Shi; H. Huang; P. S. Ho; M. L. McSwiney; M. D. Goodner; M. Moinpour; G. M. Kloster
2010
2010, vol.28, no.2
Rapid thermal annealing of ZnO thin films grown at room temperature
Young Rae Jang; Keon-Ho Yoo; Seung Min Park
2010
2010, vol.28, no.2
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