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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2003
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2013
2003, vol.21, no.1
2003, vol.21, no.2
2003, vol.21, no.3
2003, vol.21, no.4
2003, vol.21, no.5
2003, vol.21, no.5sup
2003, vol.21, no.6
题名
作者
出版年
年卷期
Metal-organic interface and charge injection in organic electronic devices
J. Campbell Scott
2003
2003, vol.21, no.3
Limits to the strength of super- and ultrahard nanocomposite coatings
S. Veprek; S. Mukherjee; P. Karvankova; H. -D. Mannling; J. L. He; K. Moto; J. Prochazka; A. S. Argon
2003
2003, vol.21, no.3
High-temperature interaction of nitrogen with thin iron films: thermal desorption kinetics studies combined with microstructure analysis of Fe-N films
W. Lisowski; E. G. Keim; M. A. Smithers
2003
2003, vol.21, no.3
Interface broadening due to Ar{sup}+ ion bombardment measured on Co/Cu multilayer at grazing angle of incidence
A. Barna; M. Menyhard; G. Zsolt; A. Koos; A. Zalar; P. Panjan
2003
2003, vol.21, no.3
Thermal stability of polycrystalline TiN/CrN superlattice coatings
Q. Yang; L. R. Zhao
2003
2003, vol.21, no.3
Fast X-ray spectroscopy study of ethene on clean and SO{sub}4 precovered Pt{111}
Adam F. Lee
2003
2003, vol.21, no.3
Beneficial influence of continuous ion bombardment during reactive sputter deposition of chromium nitride films
G. C. A. M. Janssen; R. Hoy
2003
2003, vol.21, no.3
Effect of pressure on dc planar magnetron sputtering of platinum
John H. Thomas III
2003
2003, vol.21, no.3
Quick estimation of physical etching to SiO{sub}2 among etchers with decoupled plasma sources
Guowen Ding; Wei-Te Wu; Steve Mak; Wai-Fan Yau
2003
2003, vol.21, no.3
Effect of thermal annealing on the electronic properties of nitrogen doped amorphous carbon/p-type crystalline silicon heterojunction diodes
L. Valentini; L. Lozzi; V. Salerni; I. Armentano; J. M. Kenny; S. Santucci
2003
2003, vol.21, no.3
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