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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
2001
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2003
2004
2005
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2013
2003, vol.21, no.1
2003, vol.21, no.2
2003, vol.21, no.3
2003, vol.21, no.4
2003, vol.21, no.5
2003, vol.21, no.5sup
2003, vol.21, no.6
题名
作者
出版年
年卷期
Photodesorption of gases in vacuum glazing
N. Ng; R. E. Collins; L. So
2003
2003, vol.21, no.5
Infrared spectrometer attachment assembly for use with vacuum and high-pressure cells
James A. Wingrave; Andrew V. Teplyakov
2003
2003, vol.21, no.5
Mass spectral resolution of F{sup}+ and H{sub}3O{sup}+ in very high vacuum
C. R. Cole; R. A. Outlaw; R. L. Champion; D. H. Baker; B. C. Holloway
2003
2003, vol.21, no.5
Influence of sputtering conditions on microstructure and mechanical properties of Zr-Si-N films prepared by radio-frequency-reactive sputtering
M. Zhou; M. Nose; Y. Deguchi; T. Mae; K. Nogi
2003
2003, vol.21, no.5
X-ray photoelectron spectroscopy and secondary electron yield analysis of AS and Cu samples exposed to an accelerator environment
R. A. Rosenberg; M. W. McDowell; Q. Ma; K. C. Harkay
2003
2003, vol.21, no.5
Surface reaction of bis(tertbutyIimido)bIs(diethylamIdo)tungsten precursor on Si(100)-(2×1)
Jin-Bao Wu; Yaw-wen Yang; Yi-Feng Lin; Hsin-Tien Chiu
2003
2003, vol.21, no.5
Ultrathin copper aluminum and nickel alominlde protective oxidation studied with an x-ray photoelectron spectrometer
J. F. Moore; M. P. McCann; M. J. Pellin; A. Zinovev; J. N. Hryn
2003
2003, vol.21, no.5
The role of trapped Ar atoms in the mechanical properties of boron carbide films deposited by de-magnetron sputtering
L. G. Jacobsohn; R. D. Averitt; M. Nastasi
2003
2003, vol.21, no.5
Corrosion behavior of sputter-deposited TiN thin films
R. J. Martin-Palma; M. Manso; J. M. Martinez-Duart; A. Conde; J. J. Damborenea
2003
2003, vol.21, no.5
Optimization of secondary Ion mass spectrometry detection limit for N inSiC
A. L. Pivovarov; F. A. Stevie; D. P. Griffis; G. M. Guryanov
2003
2003, vol.21, no.5
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