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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2009, vol.27, no.1
2009, vol.27, no.2
2009, vol.27, no.3
2009, vol.27, no.4
2009, vol.27, no.5
2009, vol.27, no.6
题名
作者
出版年
年卷期
Chemical and structural properties of atomic layer deposited La_2O_3 films capped with a thin Al_2O_3 layer
X. L. Li; D. Tsoutsou; G. Scarel; C. Wiemer; S. C. Capelli; S. N. Volkos; L. Lamagna; M. Fanciulli
2009
2009, vol.27, no.2
Relatively low temperature synthesis of hexagonal tungsten carbide films by N doping and its effect on the preferred orientation, phase transition, and mechanical properties
Y. D. Su; C. Q. Hu; C. Wang; M. Wen; W. T. Zheng
2009
2009, vol.27, no.2
Influence of the bias voltage on the structure and mechanical performance of nanoscale multilayer CrAlYN/CrN physical vapor deposition coatings
G. Safran; C. Reinhard; A. P. Ehiasarian; P. B. Barna; L. Szekely; O. Geszti; P. Eh. Hovsepian
2009
2009, vol.27, no.2
Thermal-mechanical modeling of nodular defect embedded within multilayer coatings
Xiulan Ling; Jianda Shao; Zhengxiu Fan
2009
2009, vol.27, no.2
Photon emission during fracture of carbon materials
K. Yasuda; K. Yamamoto; T. Shiota; Y. Matsuo
2009
2009, vol.27, no.2
Chemistry in long residence time fluorocarbon plasmas
S. P. Sant; C. T. Nelson; L. J. Overzet; M. J. Goeckner
2009
2009, vol.27, no.2
Plasma etching of Hf-based high-k thin films. Part I. Effect of complex ions and radicals on the surface reactions
Ryan M. Martin; Jane P. Chang
2009
2009, vol.27, no.2
Plasma etching of Hf-based high-k thin films. Part II. Ion-enhanced surface reaction mechanisms
Ryan M. Martin; Hans-Olof Blom; Jane P. Chang
2009
2009, vol.27, no.2
Plasma etching of Hf-based high-k thin films. Part III. Modeling the reaction mechanisms
Ryan M. Martin; Jane P. Chang
2009
2009, vol.27, no.2
Growth modes In metal-organic molecular beam epitaxy of TiO_2 on r-plane sapphire
Bharat Jalan; Roman Engel-Herbert; Joel Cagnon; Susanne Stemmer
2009
2009, vol.27, no.2
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