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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
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2003
2004
2005
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2007
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2013
2004, vol.22, no.1
2004, vol.22, no.2
2004, vol.22, no.3
2004, vol.22, no.4
2004, vol.22, no.5
2004, vol.22, no.6
题名
作者
出版年
年卷期
Poly (ethylene terephthalate) decomposition process in oxygen plasma; emission spectroscopic and surface analysis for oxygen-plasma reaction
Hidetoshi Kumagai; Denbo Hiroki; Nobuyuki Fujii; Takaomi Kobayashi
2004
2004, vol.22, no.1
Remote plasma enhanced atomic layer deposition of TiN thin films using metalorganic precursor
Ju Youn Kim; Sangwon Seo; Do Youl Kim; Hyeongtag Jeon; Yangdo Kim
2004
2004, vol.22, no.1
Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C{sub}8F{sub}18) vapor I: Deposition, morphology, structural and chemical properties
Costel Biloiu; Ioana Arabela Biloiu; Yosuke Sakai; Yoshiyuki Suda; Akitsugu Ohta
2004
2004, vol.22, no.1
Influence of negative son resputtering on ZnO:AI thin films
Loren W. Rieth; Paul H. Holloway
2004
2004, vol.22, no.1
Effect of the substrate bias voltage on the physical characteristics of copper films deposited by microwave plasma-assisted sputtering technique
F. Thiery; Y. Pauleau; L. Ortega
2004
2004, vol.22, no.1
Simple method of gas flow optimization in high rate deposition of SiO{sub}2 by electron cyclotron resonance plasma enhanced chemical vapor deposition
D. Daineka; P. Bulkin; G. Girard; B. Drevillon
2004
2004, vol.22, no.1
Performance of Inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition
Kunio Okimura; Junya Oyanagi
2004
2004, vol.22, no.1
Orientation selective epitaxial growth of CeO{sub}2(100) and CeO{sub}2(110) layers on Si(100) substrates
Tomoyasu lnoue; Naomichi Sakamoto; Masayuki Ohashi; Shigenari Shida; Yoshiyuki Sampei
2004
2004, vol.22, no.1
Contrast differences between scanning ion and scanning electron microscope images
T. Suzuki; N. Endo; M. Shibata; S. Kamasaki; T. Ichinokawa
2004
2004, vol.22, no.1
Role of fluorocarbon film formation in the ethching of silicon, silicon
T. E. F. M. Standaert; C. Hedlund; E. A. Joseph; G. S. Oehrlein; T. J. Dalton
2004
2004, vol.22, no.1
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