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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
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2003
2004
2005
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2013
2004, vol.22, no.1
2004, vol.22, no.2
2004, vol.22, no.3
2004, vol.22, no.4
2004, vol.22, no.5
2004, vol.22, no.6
题名
作者
出版年
年卷期
Comparison of pulsed and downstream deposition of fluorocarbon materials from C{sub}3F{sub}8 and c-C{sub}4F{sub}8 plasmas
InaT. Martin; Galiya Sh. Malkov; Carmen I. Butoi; Ellen R. Fisher
2004
2004, vol.22, no.2
Study of C{sub}4F{sub}8/CO and C{sub}4F{sub}8/Ar/CO plasmas for highly selective etching
Li Ling; X. Hua; X. Li; G. S. Oehrlein; F. G. Celii; K. H. R. Kirmse; P. Jiang; Yicheng Wang; H. M. Anderson
2004
2004, vol.22, no.2
Control of nitrogen depth profile In ultrathin oxynitride films formed by pufse-tlme-modulated nitrogen beams
Seiji Samukawa; Youichi Minemura; Seiichi Fukuda
2004
2004, vol.22, no.2
Preparation of TIN films by arc ion plating using dc and pulsed biases
M. D. Huang; Y. P. Lee; C. Dong; G. Q. Lin; C. Sun; L. S. Wen
2004
2004, vol.22, no.2
Some considerations on heater design
J. J. Chen; B. W. Tao; X. Z. Liu; Y. R. Li
2004
2004, vol.22, no.2
Plasma characteristics In pulsed direct current reactive magnetron sputtering of aluminum nitride thin films
Jung W. Lee; Jerome J. Cuomo; Mohamed Bourham
2004
2004, vol.22, no.2
Reactive physical vapor deposition of JlxMyH: Integrated plasma-surfs modeling characterization
Da Zhang; J. K. Schaeffer
2004
2004, vol.22, no.2
Zirconia-afymina nanolamlrsate for perforated pitting corrosion protection of stainless steel
W. F. Gaertner; E. E. Hoppe; M. A. Omari; R. S. Sorbello; C. R. Aita
2004
2004, vol.22, no.2
Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputtering
G. S. Chen; H. S. Tian; C. K. Lin; Gin-Shiang Chen; H. Y. Lee
2004
2004, vol.22, no.2
Characterization of graded InGaN/GaN epllayers grown on sapphire
T. L. Song; S. J. Chua; E. A. Fitzgerald; P. Chen; S. Tripathy
2004
2004, vol.22, no.2
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