期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2005, vol.23, no.1 2005, vol.23, no.2 2005, vol.23, no.3 2005, vol.23, no.4 2005, vol.23, no.5 2005, vol.23, no.6

题名作者出版年年卷期
Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substratesYoshi Okuyama; Carl Barelli; Christopher Tousseau; Seung Park; Yoshihide Senzaki20052005, vol.23, no.3
Comprehensive analysis of chlorine-containing capacitively coupled plasmasGerhard Franz20052005, vol.23, no.3
Removal of particles during plasma processes using a collector based on the properties of particles suspended in the plasmaHeru Setyawan; Manabu Shimada; Yutaka Hayashi; Kikuo Okuyama20052005, vol.23, no.3
Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporationJ. A. Montes de Oca Valero; Y. Le Petitcorps; J. P. Manaud; G. Chollon; F. J. Carrillo Romo; A. Lopez, M.20052005, vol.23, no.3
Amorphous transparent conductive oxide films of ln{sub}2O{sub}3-ZnO with additional Al{sub}2O{sub}3 impuritiesK. Tominaga; H. Fukumoto; K. Kondou; Y. Hayashi; K. Murai; T. Moriga; I. Nakabayashi20052005, vol.23, no.3
Role of C{sub}2F{sub}4, CF{sub}2, and ions in C{sub}4F{sub}8/Ar plasma discharges under active oxide etch conditions in an inductively coupled GEC cell reactorMarcos J. Barela; Harold M. Anderson; Gottlieb S. Oehrlein20052005, vol.23, no.3
Development of low temperature silicon oxide thin films by photo-CVD for surface passivationSumita Mukhopadhyay; Tapati Jana; Swati Ray20052005, vol.23, no.3
Investigation of the nanostructure and wear properties of physical vapor deposited CrCuN nanocomposite coatingsM. A. Baker; P. J. Kench; C. Tsotsos; P. N. Gibson; A. Leyland; A. Matthews20052005, vol.23, no.3
Wettability and thermal stability of fluorocarbon films deposited by deep reactive ion etchingYan Xin Zhuang; Aric Menon20052005, vol.23, no.3
Discharge mode transitions in low-frequency inductively coupled plasmas with internal oscillating current sheetsZ. L. Tsakadze; K. Ostrikov; E. L. Tsakadze; S. Xu20052005, vol.23, no.3
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