期刊


ISSN0734-2101
刊名Journal of Vacuum Science & Technology
参考译名真空科学与技术，A辑：真空、表面与膜
收藏年代2000～2013



全部

2000 2001 2002 2003 2004 2005
2006 2007 2008 2009 2010 2011
2012 2013

2002, vol.20, no.1 2002, vol.20, no.2 2002, vol.20, no.3 2002, vol.20, no.4 2002, vol.20, no.5 2002, vol.20, no.6

题名作者出版年年卷期
Effects of temperature on electronic properties of nickel phthalocyanine thin sandwich film structuresT. D. Anthopoulos; T. S. Shafai20022002, vol.20, no.2
Infrared spectroscopic study of dimethylaluminum-hydride adsorption on oxidized, hydrogen-terminated, reconstructed Si surfacesT. Wadayama; K. Takeuchi; K. Mukai; T. Tanabe; A. Hatta20022002, vol.20, no.2
Solid particle production in fluorocarbon plasmas II: gas phase reactions for polymerizationKazuo Takahashi; Kunihide Tachibana20022002, vol.20, no.2
Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. I. Ar pulsed plasmasPramod Subramonium; Mark J. Kushner20022002, vol.20, no.2
Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl{sub}2 pulsed plasmasPramod Subramonium; Mark J. Kushner20022002, vol.20, no.2
Synthesis and mechanical properties of boron suboxide thin filmsDenis Music; Jochen M. Schneider; Veronika Kugler; Setsuo Nakao; Ping Jin; Mattias Ostblom; Lars Hultman; Ulf Helmersson20022002, vol.20, no.2
Deposition of silicon alloys in an integrated distributed electron cyclotron resonance reactor: oxide, nitride, oxynitrides, and multilayer structuresP. Bulkin; A. Hofrichter; T. Heitz; J. Huc; B. Drevillon; J. J. Benattar20022002, vol.20, no.2
Influence of implantation and annealing on the surface topography of amorphous and polysilicon thin filmsR. Edrei; E. N. Shauly; A. Hoffman20022002, vol.20, no.2
Metallization of poly(vinylchloride) by Fe, Ni, Cu, Ag, and AuS. R. Carlo; C. Perry; Jessica Torres; D. Howard Fairbrother20022002, vol.20, no.2
Effect of O{sub}2 gas partial pressure on mechanical properties of SiO{sub}2 films deposited by radio frequency magnetron sputteringH. Fujiyama; T. Sumomogi; T. Endo20022002, vol.20, no.2
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