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期刊
ISSN
0734-2101
刊名
Journal of Vacuum Science & Technology
参考译名
真空科学与技术,A辑:真空、表面与膜
收藏年代
2000~2013
全部
2000
2001
2002
2003
2004
2005
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2007
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2013
2002, vol.20, no.1
2002, vol.20, no.2
2002, vol.20, no.3
2002, vol.20, no.4
2002, vol.20, no.5
2002, vol.20, no.6
题名
作者
出版年
年卷期
Void formation during silicidation and its influence on the thermal stability of cobalt silicide
Nam-Sik Kim; Han-Seob Cha; Nag-Kyun Sung; Hyuk-Hyun Ryu; Ki-Seog Youn; Won-Gyu Lee
2002
2002, vol.20, no.4
Model for a multiple-step deep Si etch process
Shahid Rauf; William J. Dauksher; Stephen B. Clemens; Kenneth H. Smith
2002
2002, vol.20, no.4
Bi epitaxy on polar InSb(111) A/B faces
Sunglae Cho; Young-Ho Um; Yunki Kim; George K. L. Wong; J. B. Ketterson; Jung-Il Hong
2002
2002, vol.20, no.4
Maintaining reproducible plasma reactor wall conditions: SF{sub}6 plasma cleaning of films deposited on chamber walls during Cl{sub}2/O{sub}2 plasma
Saurabh J. Ullal; Harmeet Singh; John Daugherty; Vahid Vahedi; Eray S. Aydil
2002
2002, vol.20, no.4
Calibration stability of hot cathode ionization gauges: a discussion of the importance of electron path length and gauge constant
R. N. Peacock
2002
2002, vol.20, no.4
Atomic force microscopy observation of TiO{sub}2 films deposited by dc reactive sputtering
T. Takahashi; H. Nakabayashi; T. Terasawa; K. Masugata
2002
2002, vol.20, no.4
Influence of nitrogen and temperature on the plasma deposition of fluorinated amorphous carbon films
L. Valentini; J. M. Kenny; R. M. Montereali; L. Lozzi; S. Santucci
2002
2002, vol.20, no.4
Molecular drag model based on differential reduction of the Kruger-Shapiro equations
J. C. Helmer; G. Levi
2002
2002, vol.20, no.4
Investigation and reduction of spurious peaks caused by electronstimulated desorption and outgasing by means of grid heating method in a hot-cathode quadrupole residual gas analyzer
Fumio Watanabe
2002
2002, vol.20, no.4
Investigation of surface oxides on aluminum alloys by valence band photoemission
Gregory D. Claycomb; Peter M. A. Sherwood
2002
2002, vol.20, no.4
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