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期刊
ISSN
0741-3106
刊名
IEEE Electron Device Letters
参考译名
IEEE电子器件快报
收藏年代
1998~2007
全部
1998
1999
2000
2001
2002
2003
2004
2005
2006
2007
1998, vol.19, no.1
1998, vol.19, no.10
1998, vol.19, no.11
1998, vol.19, no.12
1998, vol.19, no.2
1998, vol.19, no.3
1998, vol.19, no.4
1998, vol.19, no.5
1998, vol.19, no.6
1998, vol.19, no.7
1998, vol.19, no.8
1998, vol.19, no.9
题名
作者
出版年
年卷期
0.35-μm Asymmetric and symmetric LDD device comparison using a reliability/speed/power methodology
J. F. Chen; J. Tao; P. Fang; C. Hu
1998
1998, vol.19, no.7
4H-SiC MOSFET's utilizing the H2 surface cleaning technique
Katsunori Ueno; Ryuichi Asai; Takashi Tsuji
1998
1998, vol.19, no.7
A Ku-band T-shaped gate GaAs power MESFET with high breakdown voltage for satellite communications
Jong-Lam Lee; Haecheon Kim; Jae Kyoung Mun; Sung-Jae Maeng
1998
1998, vol.19, no.7
A new SONOS memory using source-side injection for programming
Kuo-Tung Chang; Wei-Ming Chen; Craig Swift; Jack M. Higman; Wayne M. Paulson; Ko-Min Chang
1998
1998, vol.19, no.7
A new technique for determining long-term TDDB acceleration parameters of thin gate oxides
Y. Chen; J. S. Suehle; C. -C. Shen; J. B. Bernstein; C. Messick; P. Chaparala
1998
1998, vol.19, no.7
A novel process to form cobalt silicided p+ poly-Si gates by BF2+ implantation into bilayered CoSi/a-Si films and subsequent anneal
W. K. Lai; H. W. Liu; M. H. Juang; N. C. Chen; H. C. Cheng;
1998
1998, vol.19, no.7
A possible mechanism for reconciling large gate-drain overlap capacitance with a small difference between polysilicon gate length and effective channel length in an advanced technology PFET
R. Young; L. Su; M. Ieong; S. Kapur
1998
1998, vol.19, no.7
Gas detector with low-cost micromachined field ionization tips
B. Ghodsian; M. Parameswaran; M. Syrzycki
1998
1998, vol.19, no.7
Gate current and oxide reliability in p+ poly MOS capacitors with poly-Si and poly-Ge0.3Si0.7 gate material
C. Salm; J. H. Klootwijk; Y. Ponomarev; P. W. M. Boos; D. J. Gravesteijn; P. H. Woerlee
1998
1998, vol.19, no.7
High-frequency performances of a partially deleted 0.18-μm SOI/CMOS technology at low supply voltage -- influence of parasitic elements
V. Ferlet-Cavrois; C. Marcandella; O. Musseau; J. L. Leray; J. L. Pelloie; F. Martin; S. Kolev
1998
1998, vol.19, no.7
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